Lithography today: challenges and solutions across a diverse market-Reference-Cited by-同舟云学术

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Lithography today: challenges and solutions across a diverse market

Published:2020-03-23 Issue: Volume: Page:
ISSN:
Container-title:Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
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Author:

Iwamoto Kazunori

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Open/short-TEG evaluation of 24nm-half-pitch-W damascene interconnects based on nanoimprint lithography;Novel Patterning Technologies 2024;2024-04-09

2. Electrical evaluation of copper damascene interconnects based on nanoimprint lithography compared with ArF immersion lithography for back-end-of-line process;Japanese Journal of Applied Physics;2024-02-20

3. Compact ultraviolet light-emitting diode-based lithography illumination system with tunable coherent factor;Optical Engineering;2023-04-11

4. Negative Tone Metallic Organic Resists with Improved Sensitivity for Plasma Etching: Implications for Silicon Nanostructure Fabrication and Photomask Production;ACS Applied Nano Materials;2022-11-30

5. Human brain mapping with multithousand-channel PtNRGrids resolves spatiotemporal dynamics;Science Translational Medicine;2022-01-19

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