Patterning, mask life, throughput and overlay improvements for high volume semiconductor manufacturing using nanoimprint lithography-Reference-Cited by-同舟云学术

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Patterning, mask life, throughput and overlay improvements for high volume semiconductor manufacturing using nanoimprint lithography

Published:2019-09-26 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2019
language:
Short-container-title:

Author:

Morimoto Osamu,Iwanaga Takehiko,Takabayashi Yukio,Sakai Keita,Zhang Wei,Cherala Anshuman,Im Se-Hyuk,Meissl Mario,Choi Byung Jin

Publisher

SPIE

Reference16 articles.

1. Nanoimprint lithography

2. Pattern transfer to silicon by microcontact printing and RIE

3. Template fabrication schemes for step and flash imprint lithography

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metrology;2021 IEEE International Roadmap for Devices and Systems Outbriefs;2021-11

2. Nanoimprint system alignment and overlay improvement for high volume semiconductor manufacturing;Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020;2020-03-23

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