Author:
Yeh C. W.,Huang Chao-Tien H.,Lin Kengchi,Huang C. H.,Yang Elvis,Yang T. H.,Chen K. C.,Lu Chih-Yuan
Cited by
8 articles.
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1. Bottom grating asymmetry-induced inaccuracy in diffraction-based overlay measurement;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-09-19
2. Image-based overlay target design using a grating intersection;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-09-05
3. Study of Alignment & Overlay Strategy in 14 nm Lithography Process;2020 China Semiconductor Technology International Conference (CSTIC);2020-06-26
4. Overlay improvement in nanoimprint lithography for 1×-nm patterning;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
5. Triple AIM evaluation and application in advanced node;SPIE Proceedings;2016-03-08