Image-based overlay target design using a grating intersection-Reference-Cited by-同舟云学术

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Image-based overlay target design using a grating intersection

Published:2022-09-05 Issue:03 Volume:21 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Lee Hyunchul¹,Chang Hyunjin¹,Shin Hyeongi¹,Choi Okkyung²

Affiliation:

1. Auros Technology Inc., Hwaseong-si, Republic of Korea

2. Myongji University, Bangmok College of General Education, Yongin-si, Republic of Korea

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Arts and Humanities

Reference30 articles.

1. Overlay metrology: the systematic, the random and the ugly

2. Optimized Overlay Metrology Marks: Theory and Experiment

3. Comparison of Optical Aberrations and Contrast Sensitivity Between Aspheric and Spherical Intraocular Lenses

4. Layout optimization for multilayer overlay targets

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mitigating the Impact of Asymmetric Deformation on Advanced Metrology for Photolithography;Applied Sciences;2024-05-23

2. Small angle x-ray scattering overlay metrology for advanced nodes;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

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