Author:
Malloy Matt,Thiel Brad,Bunday Benjamin D.,Wurm Stefan,Jindal Vibhu,Mukhtar Maseeh,Quoi Kathy,Kemen Thomas,Zeidler Dirk,Eberle Anna Lena,Garbowski Tomasz,Dellemann Gregor,Peters Jan Hendrik
Reference11 articles.
1. Assessing the Viability of Multi-Electron Beam Wafer Inspection for sub-20 nm Defects;Thiel,2014
2. Defect metrology challenges at the 11-nm node and beyond
3. L. Muray, J. Spallas, and D. Meisburger, “On the Limits of Miniature Electron Column Technology”, Proc. SPIE 9236, Scanning Microscopies 2014, 92360C (16 September 2014).
4. Further advancing the throughput of a multi-beam SEM;Kemen,2015
5. High throughput defect detection with multiple parallel electron beams;van Himbergen,2007