Author:
Muray Lawrence,Spallas James,Meisburger Dan
Cited by
9 articles.
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1. Throughput limits for ultra-low voltage electron-beam lithography;Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology;2023-09-29
2. Optimized structure of standard sample with programed defects for pattern inspection using electron beams;Journal of Vacuum Science & Technology B;2018-11
3. Notes and References;Principles of Electron Optics;2018
4. Ultralow voltage imaging using a miniature electron beam column;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
5. High-brightness miniature column for high-speed multicolumn wafer inspection;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-11