Optimized structure of standard sample with programed defects for pattern inspection using electron beams-Reference-Cited by-同舟云学术

Optimized structure of standard sample with programed defects for pattern inspection using electron beams

Published:2018-11 Issue:6 Volume:36 Page:06J502
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Iida Susumu¹,Uchiyama Takayuki¹

Affiliation:

1. Evolving Nano Process Infrastructure Development Center, Inc., 16-1 Onogawa, Tsukuba-shi, Ibaraki-ken 305-8569, Japan

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5048047

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-10

2. Low-voltage aberration-corrected SEM metrology of thin resist for high-NA EUVL;Metrology, Inspection, and Process Control XXXVI;2022-05-26

3. Precision fabrication of EUVL programmed defects with helium ion beam patterning;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-04-27

4. Development of standard samples with programmed defects for evaluation of pattern inspection tools for 7-nm and smaller nodes;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-09-13

5. Standard wafer with programed defects to evaluate the pattern inspection tools for 300-mm wafer fabrication for 7-nm node and beyond;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-06-19