Polarization resolved measurements with the new EUV ellipsometer of PTB-Reference-Cited by-同舟云学术

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Polarization resolved measurements with the new EUV ellipsometer of PTB

Published:2015-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Soltwisch Victor,Fischer Andreas,Laubis Christian,Stadelhoff Christian,Scholze Frank,Ullrich Albrecht

Publisher

SPIE

Reference19 articles.

1. EUV Lithography;Bakshi,2009

2. EUV Lithography: NXE3100 is in Use at Customer Sites and Building of NXE3300B has Started;Peeters,2011

3. High-sensitivity high-stability silicon photodiodes for DUV, VUV and EUV spectral ranges;Shi,2011

4. Reflective Optics for Next Generation Lithography;Yulin,2011

5. A new Laboratory EUV Reflectometer for Large Optics using a Laser Plasma Source;van Loyen,2003

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical properties of thin film materials at short wavelengths;Optical Thin Films and Coatings;2018

2. EUV optical characterization of alternative membrane materials for EUV pellicles;Photomask Technology;2017-10-16

3. Update on optical material properties for alternative EUV mask absorber materials;33rd European Mask and Lithography Conference;2017-09-28

4. Multiparameter characterization of subnanometre Cr/Sc multilayers based on complementary measurements;Journal of Applied Crystallography;2016-11-24

5. Update on EUV radiometry at PTB;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18

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