1. Block copolymer directed self-assembly enables sublithographic patterning for device fabrication;Wong,2012
2. Imprint Lithography with 25-Nanometer Resolution
3. Process capability comparison between LELE DPT and spacer for NAND flash 32nm and below;Tseng,2008
4. Utilization of spin-on and reactive ion etch critical dimension shrink with double patterning for 32 nm and beyond contact level interconnects;Petrillo,2009
5. Overview: continuous evolution on double-patterning process;Yaegashi,2012