Challenges for immersion lithography extension based on negative tone imaging (NTI) process-Reference-Cited by-同舟云学术

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Challenges for immersion lithography extension based on negative tone imaging (NTI) process

Published:2016-03-25 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Shirakawa Michihiro,Omatsu Tadashi,Ou Keiyu,Yonekuta Yasunori,Hatakeyama Naoya,Asakawa Daisuke,Yakushiji Takashi,Fujita Mitsuhiro,Muraki Nanae

Publisher

SPIE

Reference16 articles.

1. Negative-tone imaging (NTI) at the 22nm node : process and material development;Tarutani,2011

2. Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond);Landie,2011

3. Negative tone development, gaining insight throught physical simulation;Robertson,2011

4. Functional resist materials for negative tone development in advanced lithography;Tarutani,2012

5. Advanced patterning approaches based on negative-tone development (NTD) process for further extension of 193nm immersion lithography;Shirakawa,2015

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