Patterning chemistry of HafSOx resist-Reference-Cited by-同舟云学术

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Patterning chemistry of HafSOx resist

Published:2014-03-27 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Amador Jenn M.,Decker Shawn R.,Lucchini Stefan E.,Ruther Rose E.,Keszler Douglas A.

Publisher

SPIE

Reference9 articles.

1. Advanced Functional Materials

2. High resolution, high sensitivity inorganic resists

3. Photopatternable Inorganic Hardmask;Telecky,2010

4. Evaluation of resist performance with EUV interference lithography for sub-22 nm patterning;Ekinci,2012

5. Chemical and Structural Investigation of High-Resolution Patterning with HafSOx

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Differentiating Zr/HfIV Aqueous Polyoxocation Chemistry with Peroxide Ligation;Inorganic Chemistry;2021-01-11

2. First-row transitional-metal oxalate resists for EUV;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-12-19

3. Mechanistic Study of HafSOx Extreme Ultraviolet Inorganic Resists;The Journal of Physical Chemistry C;2018-06-20

4. Extreme ultraviolet patterning of tin-oxo cages;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-09-15

5. Alkyltin Keggin Clusters Templated by Sodium;Angewandte Chemie International Edition;2017-06-14

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