Comparison of EUV and e-beam lithographic technologies for sub-22-nm node patterning-Reference-Cited by-同舟云学术

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Comparison of EUV and e-beam lithographic technologies for sub-22-nm node patterning

Published:2012-03-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Cameron James,Thackeray Jim,Sung Jin Wuk,Coley Suzanne M.,Jain Vipul,Ongayi Owendi,Wagner Mike D.,LaBeaume Paul,Kwok Amy,Valeri David,Hellion Marie,Icard Béatrice,Dal'zotto Bernard,Sourd Claire,Pain Laurent

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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