EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer-Reference-Cited by-同舟云学术

EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer

Published:2018 Issue:20 Volume:8 Page:10930-10938
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Moura Cleverson Alves da Silva¹²³⁴⁵,Belmonte Guilherme Kretzmann¹²³⁴⁵,Reddy Pulikanti Guruprasad⁶⁷⁸^ORCID,Gonslaves Kenneth E.⁶⁷⁸^ORCID,Weibel Daniel Eduardo¹²³⁴⁵^ORCID

Affiliation:

1. Department of Chemical Physics

2. Chemical Institute

3. UFRGS

4. Porto Alegre

5. Brazil

6. School of Basic Sciences

7. Indian Institute of Technology Mandi

8. India

Abstract

Understanding the EUV photofragmentation mechanism in a highly sensitive hybrid n-CAR containing SbF₆⁻ as an absorption enhancer.

Funder

Conselho Nacional de Desenvolvimento Científico e Tecnológico

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior

Intel Corporation

Council for Scientific and Industrial Research

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/RA/C7RA12934C

Reference54 articles.

1. https://www.euvlitho.com/2017/2017%20EUVL%20Workshop%20First%20Call%20for%20Papers.pdf

2. Chemical Amplification Resists for Microlithography

3. Chemical Amplification in High-Resolution Imaging Systems

4. Recent advances in non-chemically amplified photoresists for next generation IC technology

5. High refractive index and high transparency HfO2 nanocomposites for next generation lithography

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