Recent advances in non-chemically amplified photoresists for next generation IC technology
Author:
Affiliation:
1. School of Basic Sciences
2. Indian Institute of Technology Mandi
3. Himachal Pradesh – 175005
4. India
5. School of Computing and Electrical Engineering
Abstract
The present article reviews the recent advances in the area of non-chemically amplified photoresists particularly for sub-30 nm nodes.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA12077F
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