Full field EUV lithography turning into a reality at IMEC-Reference-Cited by-同舟云学术

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Full field EUV lithography turning into a reality at IMEC

Published:2007-05-03 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Jonckheere Rik,Lorusso Gian Francesco,Goethals Anne Marie,Hermans Jan,Baudemprez Bart,Myers Alan,Kim Insung,Niroomand Ardavan,Iwamoto Fumio,Stepanenko Nickolay,Ronse Kurt

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Research on Radiation Emission Detection Method of Lithography Machine Subsystem;2023 International Conference on Computer Science and Automation Technology (CSAT);2023-10-06

2. 光刻对准关键技术的发展与挑战;Acta Optica Sinica;2023

3. Optimized Multigrid Strategy for Accurate Flare Modeling with Three-Dimensional Mask Effect in Extreme-Ultraviolet Lithography;Japanese Journal of Applied Physics;2012-06-20

4. Extreme Ultraviolet Process Optimization for Contact Layer of 14 nm Node Logic and 16 nm Half Pitch Memory Devices;Japanese Journal of Applied Physics;2012-06-20

5. Optimized Multigrid Strategy for Accurate Flare Modeling with Three-Dimensional Mask Effect in Extreme-Ultraviolet Lithography;Japanese Journal of Applied Physics;2012-06-01

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