Author:
Zhao Qian,Wang ChangAn,Shi Hong-Fei,Guerrero James,Feng Mu,Wang Jen-Shiang,Koh Kar K.,Zhang Dong Q.,Zhang Hongxin,Krishnamurthy Subramanian,Fei Ray,Lin Chiawen,Fang Wei,Wang Fei,Wang Jazer,Wang Lei,Zhang Qiang,Liang Jiao,Guo Yunbo,Zhang Chen,Wallow Tom,Rio David,Wang Lester,Wang Alvin,Gronlund Keith,Lang Jun
Reference10 articles.
1. Adoption of OPC and the impact on design and layout;Schellenberg,2001
2. Advanced optical lithography development, from UV to EUV
3. Enabling scanning electron microscope contour-based optical proximity correction models
4. SEM-Contour Based Mask Modeling;Vasek,2008
5. High-precision contouring from SEM image in 32-nm litho graphy and beyond;Shindo,2009
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献