Scatterometry-based metrology for SAQP pitch walking using virtual reference-Reference-Cited by-同舟云学术

Scatterometry-based metrology for SAQP pitch walking using virtual reference

Published:2016-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Kagalwala Taher¹,Vaid Alok¹,Mahendrakar Sridhar¹,Lenahan Michael¹,Fang Fang¹,Isbester Paul²,Shifrin Michael³,Etzioni Yoav³,Cepler Aron²,Yellai Naren²,Dasari Prasad²,Bozdog Cornel⁴

Affiliation:

1. GLOBALFOUNDRIES (United States)

2. Nova Measuring Instruments, Inc. (United States)

3. Nova Measuring Instruments LTD (Israel)

4. ReVera (United States)

Publisher

SPIE

Reference5 articles.

1. Scatterometry as technology enabler for embedded SiGe process

2. Integrated Metrology's role in Gas Cluster Ion Beam etch;Kagalwala,2015

3. Dixit D., Kamineni V., Farrell R., et al., “Metrology for block copolymer directed self-assembly structures using mueller matrix-based scatterometry”. J. Micro/Nanolith. MEMS MOEMS, DOI:10.1117/1.JMM.14.2.021102

4. Implementation of hybrid metrology at HVM fab for 20nm and beyond

5. Improved scatterometry time-to-solution using virtual reference;Vaid,2015

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