1. Pattern centric OPC flow: a special RET flow with fast turn-around-time,;Wang,2008
2. Pre-OPC layout decomposition for improved image fidelity,;Abdelwahed,2009
3. Optical proximity correction with hierarchical Bayes model,;Matsunawa,2015
4. Manufacturability study of masks created by inverse lithography technology (ILT),;Martin,2005
5. Machine learning for inverse lithography: using stochastic gradient descent for robust photomask synthesis