Inhomogeneity of PAGs in a hybrid-type EUV resist system studied by molecular-dynamics simulations for EUV lithography

Author:

Toriumi Minoru,Itani Toshiro

Publisher

SPIE

Reference13 articles.

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Lithography in a quantum world;Japanese Journal of Applied Physics;2023-02-17

2. Nanometrology for evaluating rare sites for molecular homogeneity;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-28

3. Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-09-13

4. Understanding the photoacid generator distribution at nanoscale using massive cluster secondary ion mass spectrometry;Advances in Patterning Materials and Processes XXXVI;2019-03-25

5. Computational approach on PEB process in EUV resist: multi-scale simulation;SPIE Proceedings;2017-03-24

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