Inhomogeneity of PAGs in a hybrid-type EUV resist system studied by molecular-dynamics simulations for EUV lithography-Reference-Cited by-同舟云学术

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Inhomogeneity of PAGs in a hybrid-type EUV resist system studied by molecular-dynamics simulations for EUV lithography

Published:2015-03-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Patterning Materials and Processes XXXII
language:
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Author:

Toriumi Minoru,Itani Toshiro

Publisher

SPIE

Reference13 articles.

1. Extreme Ultraviolet Lithography Development in the United States

2. Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists

3. Theoretical analysis of energy degradation of electrons in the resists;Toriumi,2009

4. Microlithography · Molecular Imprinting

5. Structure of poly(p-hydroxystyrene) film;Toriumi,1991

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1. Lithography in a quantum world;Japanese Journal of Applied Physics;2023-02-17

2. Nanometrology for evaluating rare sites for molecular homogeneity;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-28

3. Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-09-13

4. Understanding the photoacid generator distribution at nanoscale using massive cluster secondary ion mass spectrometry;Advances in Patterning Materials and Processes XXXVI;2019-03-25

5. Computational approach on PEB process in EUV resist: multi-scale simulation;SPIE Proceedings;2017-03-24

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