Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists-Reference-Cited by-同舟云学术

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Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists

Published:2009 Issue:1 Volume:22 Page:25-29
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Allen Robert D.,Brock Phillip J.,Na Young-Hye,Sherwood Mark H.,Truong Hoa D.,Wallraff Gregory M.,Fujiwara Masaki,Maeda Kazuhiko

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/22/1/22_1_25/_pdf

Reference5 articles.

1. Chemical Amplification Resists for Microlithography

2. 2. C-T. Lee, C. L. Henderson, M. Wang, K. E. Gonsalves and W. Yueh, J. Vac. Sc. Technol., B 25(6), (2007) 2136.

3. 3. R. Weiss, W. MacKnight, R. Lundberg, K. Mauritz, C. theis, and D. Brant, "Structure and Applications of Ion-containing Polymers", ACS Symposium Series 302, Ed. A. Eisenberg and F. E. Bailey, (1986) 2-19.

4. 4. R. Sooriyakumaran, R. DiPietro, H. Truong, P. Brock, R. Allen, L. Bozano, I. Popova, W-S. Huang, R. Chen, M. Khojasteh, and P. R. Varanasi, " A New Class of Low Bake Resists for 193-nm Immersion Lithography", Proc. SPIE, 6923, 69230C, (2008).

5. Diffusion and Distribution Studies of Photoacid Generators. Ion Beam Analysis in Lithograpy.

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