MBMW-101: World's 1st high-throughput multi-beam mask writer
Author:
Affiliation:
1. IMS Nanofabrication AG (Austria)
Publisher
SPIE
Reference7 articles.
1. Christof Klein, Hans Loeschner, and Elmar Platzgummer, “Performance of the Proof-of-Concept Multi-Beam Mask Writer (MBMW POC)”, Proc. SPIE 8880, 88801E (2013)
2. International Technology Roadmap for Semiconductors (ITRS), 2015 Edition, http://www.itrs2.net/
3. 2016 eBeam Initiative Mask Maker Survey Results, http://www.ebeam.org/docs/ebeam_survey_mask_2016.pdf
4. Mahesh Chandramouli, Frank Abboud, Nathan Wilcox, Andrew Sowers, and Damon Cole, “Future Mask Writers Requirements for the Sub 10 nm Node Era”, Proc. SPIE Vol. 8522, 85221K (2012).
5. Frank E. Abboud, Michael Asturias, and Mahesh Chandramouli, “Mask Data Processing in the Era of Multibeam Writers”, Proc. SPIE Vol. 9235, 92350W (2014).
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