Performance of the proof-of-concept multi-beam mask writer (MBMW POC)
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SPIE
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Multi e-beam direct write: what are the options for the future?;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-12-06
2. Curvilinear mask process correction: status quo and outlook;37th European Mask and Lithography Conference;2022-11-01
3. Mechanical Properties of 3D Nanostructures Obtained by Focused Electron/Ion Beam-Induced Deposition: A Review;Micromachines;2020-04-10
4. Development and deployment of advanced multi-beam mask writer;Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020;2020-03-23
5. CLMPC: curvilinear MPC in a mask data preparation flow;Photomask Technology;2017-10-31
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