1. Contributions to the effective work function of platinum on hafnium dioxide
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3. Examination of flatband and threshold voltage tuning of HfO2∕TiN field effect transistors by dielectric cap layers
4. Structural and electrical properties of HfLaOx films for an amorphous high-k gate insulator
5. Interfacial chemistry of the Ba/SiOxNy/Si(100) nanostructure