Modeling of charge quantization and wave function penetration effects in a metal–oxide–semiconductor system with ultrathin gate oxide
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Reference16 articles.
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3. Accumulation gate capacitance of MOS devices with ultrathin high-/spl kappa/ gate dielectrics: modeling and characterization;IEEE Transactions on Electron Devices;2006-06
4. A Physically Based Compact Gate<tex>$Chbox--V$</tex>Model for Ultrathin (EOT<tex>$sim1~hbox nm$</tex>and Below) Gate Dielectric MOS Devices;IEEE Transactions on Electron Devices;2005-06
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