Effect of argon and oxygen gas concentration on mode transition and negative ion production in helicon discharge
Author:
Affiliation:
1. Centre of Plasma Physics-Institute for Plasma Research, Tepesia, Sonapur, Kamrup, Assam 782402, India
2. Institute for Plasma Research, HBNI, Bhat, Gandhinagar 382428, Gujarat, India
Funder
Institute for Plasma Research,Gandhinagar, India
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0025127
Reference50 articles.
1. Global model of Ar, O2, Cl2, and Ar/O2 high‐density plasma discharges
2. Effect of Ar addition to an O2 plasma in an inductively coupled, traveling wave driven, large area plasma source: O2/Ar mixture plasma modeling and photoresist etching
3. Increased O(D1) metastable density in highly Ar-diluted oxygen plasmas
4. Surface dependent electron and negative ion density in SF[sub 6]/argon gas mixtures
5. Deposition and characterization of vanadium oxide based thin films for MOS device applications
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