Low‐temperatureinsitusurface cleaning of oxide‐patterned wafers by Ar/H2plasma sputter
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346180
Reference15 articles.
1. Insitusubstrate‐surface cleaning for very low temperature silicon epitaxy by low‐kinetic‐energy particle bombardment
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3. Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBE
4. Homoepitaxial films grown on Si (100) at 150 °C by remote plasma‐enhanced chemical vapor deposition
5. Low‐temperature native oxide removal from silicon using nitrogen trifluoride prior to low‐temperature silicon epitaxy
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