Atomic layer etching of SiO2 for surface cleaning using ammonium fluorosilicate with CF4/NH3 plasma
Author:
Affiliation:
1. School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon 16419, South Korea
2. SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SKKU), Suwon 16419, South Korea
Funder
National Research Foundation of Korea
Ministry of Trade, Industry and Energy
Korea Institute of Energy Technology Evaluation and Planning
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5132986
Cited by 16 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma;Journal of Vacuum Science & Technology A;2024-09-01
2. Atomic layer etching of SiCO films with surface modification by O2 and CF4/NH3/Ar plasmas and desorption by IR annealing;Journal of Vacuum Science & Technology A;2024-06-07
3. Etching selectivity of SiO2 to SiN using HF and methanol at higher pressures up to 900 Pa;Japanese Journal of Applied Physics;2024-06-03
4. Total cross section measurements of electron scattering from NH3 in the intermediate-energy region;The European Physical Journal D;2024-05
5. Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6);Journal of Vacuum Science & Technology A;2024-04-16
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3