Auger analysis of chlorine in ``HCl‐ or Cl2‐grown'' SiO2films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1654681
Reference2 articles.
1. Neutralization of Na+ Ions in ``HCl‐Grown'' SiO2
2. The Effect of HCl and Cl[sub 2] on the Thermal Oxidation of Silicon
Cited by 50 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. THERMAL OXIDATION OF SILICON AND Si-SiO2 INTERFACE MORPHOLOGY, STRUCTURE AND LOCALIZED STATES;Handbook of Surfaces and Interfaces of Materials;2001
2. Auger Electron Spectroscopy;Microanalysis of Solids;1994
3. The effects of Cl2 on the oxidation of single crystal silicon carbide;Corrosion Science;1992-04
4. Silicon Gate Oxide Thickness Uniformity during HCl Oxidation;Journal of The Electrochemical Society;1991-01-01
5. Analysis and characterization of thin films: A tutorial;Solar Cells;1988-07
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