Unoxidized porous Si as an isolation material for mixed-signal integrated circuit applications
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1555700
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3. High-performance ultra-low-k fluorine-doped nanoporous organosilica films for inter-layer dielectric;Journal of Materials Science;2018-10-22
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