Improvement of structural quality of AlN layers grown on c-plane sapphire substrate by metal–organic vapor phase epitaxy using post-growth annealing with trimethylgallium-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Improvement of structural quality of AlN layers grown on c-plane sapphire substrate by metal–organic vapor phase epitaxy using post-growth annealing with trimethylgallium

Published:2022-01-01 Issue:1 Volume:12 Page:015203
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Imura Masataka¹^ORCID,Inaba Hideki¹,Mano Takaaki¹^ORCID,Ishida Nobuyuki²^ORCID,Uesugi Fumihiko³^ORCID,Kuroda Yoko³,Nakayama Yoshiko³^ORCID,Takeguchi Masaki³^ORCID,Koide Yasuo¹^ORCID

Affiliation:

1. Research Center for Functional Materials, National Institute for Materials Science (NIMS), Namiki, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan

2. Research Center for Advanced Measurement and Characterization, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

3. Transmission Electron Microscopy Analysis Station, NIMS, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan

Funder

Japan Society for the Promotion of Science

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0076706

Reference24 articles.

1. The emergence and prospects of deep-ultraviolet light-emitting diode technologies

2. Band parameters for nitrogen-containing semiconductors

3. Efficiency improvement of AlGaN-based deep-ultraviolet light-emitting diodes and their virus inactivation application

4. Preparation of a Freestanding AlN Substrate from a Thick AlN Layer Grown by Hydride Vapor Phase Epitaxy on a Bulk AlN Substrate Prepared by Physical Vapor Transport

5. Large-area AlN substrates for electronic applications: An industrial perspective

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP