Formation mechanism of crystallites in the as‐deposited mixed‐phase low pressure chemical vapor deposition silicon thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.360971
Reference28 articles.
1. Growth and Physical Properties of LPCVD Polycrystalline Silicon Films
2. Low resistance polycrystalline silicon by boron or arsenic implantation and thermal crystallization of amorphously deposited films
3. High‐resolution transmission electron microscopy study of solid phase crystallized silicon thin films on SiO2: Crystal growth and defects formation
4. Large grain polycrystalline silicon by low‐temperature annealing of low‐pressure chemical vapor deposited amorphous silicon films
5. Structure and Stability of Low Pressure Chemically Vapor‐Deposited Silicon Films
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