Substrate selective deposition and etching of silicon thin films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359013
Reference24 articles.
1. Preparation and Characterization of Highly Conductive (100 S/cm) Phosphorus Doped νc-Si:H Films Deposited Using the VHF-GD Technique
2. Optoelectronics and Photovoltaic Applications of Microcrystalline Sic
3. A comparison of amorphous and poly crystalline TFTs for LC displays
4. A thermodynamic criterion of the crystalline-to-amorphous transition in silicon
5. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
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1. Selective deposition of a crystalline Si film by a chemical sputtering process in a high pressure hydrogen plasma;Journal of Applied Physics;2015-07-28
2. Recombination and resistive losses at ZnO∕a‐Si:H∕c‐Si interfaces in heterojunction back contacts for Si solar cells;Journal of Applied Physics;2007-11
3. Probing the phase composition of silicon films in situ by etch product detection;Applied Physics Letters;2007-10-15
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