Exploring conductivity in ex-situ doped Si thin films as thickness approaches 5 nm-Reference-Cited by-同舟云学术

Exploring conductivity in ex-situ doped Si thin films as thickness approaches 5 nm

Published:2019-06-14 Issue:22 Volume:125 Page:225709
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

MacHale John¹,Meaney Fintan¹,Kennedy Noel²^ORCID,Eaton Luke²,Mirabelli Gioele¹^ORCID,White Mary¹,Thomas Kevin¹,Pelucchi Emanuele¹^ORCID,Petersen Dirch Hjorth³,Lin Rong⁴,Petkov Nikolay⁵,Connolly James⁶,Hatem Chris⁷,Gity Farzan¹^ORCID,Ansari Lida¹^ORCID,Long Brenda¹²^ORCID,Duffy Ray¹^ORCID

Affiliation:

1. Tyndall National Institute, University College Cork, Lee Maltings, Cork T12 R5CP, Ireland

2. School of Chemistry, University College Cork, Cork T12 K8AF, Ireland

3. Department of Physics, Technical University of Denmark, Fysikvej, Bld. 307, DK-2800 Kongens Lyngby, Denmark

4. CAPRES—A KLA Company, Scion-DTU, Bld. 373, DK-2800 Kongens Lyngby, Denmark

5. Cork Institute of Technology, Bishopstown, Cork T12 P928, Ireland

6. Applied Materials, Lee Maltings, Cork T12 R5CP, Ireland

7. Applied Materials, Gloucester, Massachusetts 01930, USA

Funder

SFI/HEA Centre for High End Computing

Enterprise Ireland

European Regional Development Fund

Horizon 2020 Framework Programme

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5098307

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