Structural and electrical properties of neodymium oxide high-k gate dielectrics
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2402237
Reference13 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Atomic Layer Deposition of Lanthanum Oxide Films for High-κ Gate Dielectrics
3. Praseodymium silicate formed by postdeposition high-temperature annealing
4. Excellent frequency dispersion of thin gadolinium oxide high-k gate dielectrics
5. Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si
Cited by 48 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effects of Varying Annealing Ambient towards Performance of Ternary GaxCeyOz Passivation Layers for Metal-Oxide-Semiconductor Capacitor;International Journal of Energy Research;2024-02-16
2. Boronization: A General Strategy for Rare Earth Oxides with Enhanced High-κ Gate Dielectric Performance;ACS Applied Materials & Interfaces;2023-11-07
3. Modification of interface properties of Au/n-GaN Schottky junction by rare-earth oxide Nd2O3 as an interlayer and its microstructural characterization;Vacuum;2023-09
4. Enhanced photoresponse performance in GaN based symmetric type MSM ultraviolet-A and MIS ultraviolet-A to C photodetectors;Sensors and Actuators A: Physical;2022-06
5. Significantly improved high k dielectric performance: Rare earth oxide as a passivation layer laminated with TiO2 film;Journal of Rare Earths;2022-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3