Noninvasive monitoring of ion energy drift in an inductively coupled plasma reactor
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1834977
Reference47 articles.
1. Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of silicon
2. Characteristics and mechanism of etch process sensitivity to chamber surface condition
3. Novel radio‐frequency induction plasma processing techniques
4. Influence of reactor wall conditions on etch processes in inductively coupled fluorocarbon plasmas
5. Effect of electrode material on measured ion energy distributions in radio‐frequency discharges
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath;Sensors;2022-08-20
2. In situ measurement of electron emission yield at silicon dioxide surfaces exposed to argon plasmas;Plasma Sources Science and Technology;2021-02-01
3. Velocity boundary conditions for positive ions entering radio-frequency sheaths in electronegative plasmas;Journal of Applied Physics;2017-08-07
4. Estimation and Control in Semiconductor Etch: Practice and Possibilities;IEEE Transactions on Semiconductor Manufacturing;2010-02
5. Influence of the reactor wall composition on radicals’ densities and total pressure in Cl2 inductively coupled plasmas: II. During silicon etching;Journal of Applied Physics;2007-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3