Absolute total and partial cross sections for the electron impact ionization of tetrafluorosilane (SiF4)
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1333018
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1. The design of plasma etchants
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4. Polycrystalline silicon film growth in a SiF4/SiH4/H2 plasma
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