Formation of multiply faulted defects in oxygen implanted silicon‐on‐insulator material
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347232
Reference11 articles.
1. Formation of buried insulating layers in silicon by the implantation of high doses of oxygen
2. Synthesis of Buried Silicon Compounds Using Ion Implantation
3. New conditions for synthesizing SOI structures by high dose oxygen implantation
4. Optimized conditions for the formation of buried insulating layers in Si by high dose implantation of oxygen
5. Precipitate and Defect Formation in Oxygen Implanted Silicon-on-Insulator Material
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Annealing of hydrogen-induced defects in RF-plasma-treated Si wafers:ex situandin situtransmission electron microscopy studies;Journal of Physics D: Applied Physics;2011-06-30
2. Effect of a thin surface coating layer on thermal stresses within an elastic half-plane;Acta Mechanica;2006-07-04
3. The Effects of Surface Capping during Annealing on the Microstructure of Ultrathin SIMOX Materials;Journal of The Electrochemical Society;2001
4. Effect of annealing conditions on the formation of low-dose SIMOX structures implanted at 190 keV;Journal of Materials Science: Materials in Electronics;2001
5. Control of Si-Island Free Ultra-Thin Simox Structures by Implant Energy and Oxygen Dose;Microscopy and Microanalysis;1999-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3