Deep sub-60 mV/dec subthreshold swing independent of gate bias sweep direction in an in situ SiN/Al0.6Ga0.4N/GaN-on-Si metal-insulator high electron mobility transistor

Abstract

In this Letter, we demonstrated deep sub-60 mV/dec subthreshold swings (SS) independent of gate bias sweep direction in GaN-based metal–insulator–semiconductor high electron mobility transistors (MISHEMTs) with an Al0.6Ga0.4N/GaN heterostructure and in situ SiN as gate dielectric and surface passivation. Average SS values of 22 and 29 mV/dec over 3–4 orders of drain current (ID) swing were measured during forward and reverse sweeps, respectively, in a 75-nm gate length (LG) device. Sub-60 mV/dec SS was also observed in the GaN MISHEMTs with longer LG up to 350 nm. The intrinsic physical mechanisms of deep sub-60 mV/dec SS were comprehensively studied. The observed negative differential resistance in the gate current, the kinks in the output ID-VD curve, and the capacitance spike in the depletion region of the C–V curves suggest that the capture and emission of electrons in the traps are the dominant physical mechanisms responsible for the small SS.