In situ characterization of titanium silicide formation: The effect of Mo interlayer, temperature ramp-rate, and annealing atmosphere
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.369626
Reference27 articles.
1. Metastable phase formation in titanium‐silicon thin films
2. Nucleation of a new phase from the interaction of two adjacent phases: Some silicides
3. Formation of a crystalline metal-rich silicide in thin film titanium/silicon reactions
4. The C49 to C54 Phase Transformation in TiSi2 Thin Films
5. Titanium disilicide formation on heavily doped silicon substrates
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