Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties-Reference-Cited by-同舟云学术

Competing growth of titanium nitrides and silicides in Ti thin films processed in expanding microwave plasma: Morphology and microstructural properties

Published:2018-09 Issue:9 Volume:8 Page:095105
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Jauberteau Isabelle¹,Carles Pierre¹,Mayet Richard¹,Cornette Julie¹,Bessaudou Annie²,Jauberteau Jean Louis¹^ORCID

Affiliation:

1. Faculté des Sciences et des Techniques, Université de Limoges, CNRS, IRCER, UMR 7315, CEC, 12 rue Atlantis, F-87068 Limoges, France

2. Faculté des Sciences et des Techniques, Université de Limoges, CNRS, XLIM, UMR6172, 123 av. A. Thomas, F-87060 Limoges, France

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5035188

Reference31 articles.

1. A thickness model for the stack in the titanium salicide process module

2. Ambient Gas Effects on the Reaction of Titanium with Silicon

3. The growth of titanium silicides in thin film Ti/Si structures

4. A transmission electron microscopic study of titanium silicides fabricated by implantation of titanium into silicon and thermal annealing

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Large Transfer of Nitrogen, Silicon and Titanium through Various Thin Mo–Ti/Si and Ti–Mo/Si Bilayer Films Processed in Expanding Microwave Plasma: Formation of Nitrides and Silicides;Coatings;2023-10-18

2. Expanding Plasma Process for Nitriding Mo–Ti Bilayer Thin Films;Coatings;2019-02-05