Self-assembled-monolayer film islands as a self-patterned-mask for SiO2 thickness measurement with atomic force microscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.119183
Reference21 articles.
1. Optical Evidence for a Silicon‐Silicon Oxide Interlayer
2. Optical Properties of the Interface between Si and Its Thermally Grown Oxide
3. The Evolution of Si / SiO2 Interface Roughness
4. Measurements and Modeling of Thin Silicon Dioxide Films on Silicon
5. Measurement of Ultrathin (<100 Å) Oxide Films by Multiple‐Angle Incident Ellipsometry
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