Metallic contamination in silicon during plasma resist stripping: A deep level transient spectroscopy study
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.101136
Reference11 articles.
1. RIE Contamination of Etched Silicon Surfaces
2. Heavy Metal Contamination from Resists during Plasma Stripping
3. A Parametric Study of the Etching of Silicon in SF6Microwave Multipolar Plasmas: Interpretation of Etching Mechanisms
4. Interstitial iron and iron-acceptor pairs in silicon
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