A Parametric Study of the Etching of Silicon in SF6Microwave Multipolar Plasmas: Interpretation of Etching Mechanisms-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

A Parametric Study of the Etching of Silicon in SF6Microwave Multipolar Plasmas: Interpretation of Etching Mechanisms

Published:1987-06-20 Issue:Part 1, No. 6 Volume:26 Page:825-834
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Petit B.,Pelletier J.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 69 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechanisms for enhancement of sensing performance in CMOS ISFET arrays using reactive ion etching;Sensors and Actuators B: Chemical;2019-08

2. Oxygen plasma etching of hydrocarbon-like polymers: Part I Modeling;Plasma Processes and Polymers;2018-05-25

3. Black silicon method: X. A review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment;Journal of Micromechanics and Microengineering;2009-02-02

4. Influence of the positive ion composition on the ion-assisted chemical etch yield of SrTiO3 films in Ar∕SF6 plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-05

5. Characterizing and Predicting Spatial Nonuniformity in the Deep Reactive Ion Etching of Silicon;Journal of The Electrochemical Society;2006

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP