EBIS-based HCI micro-beams
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http://aip.scitation.org/doi/pdf/10.1063/1.5053408
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5. D. Spemann, J. Meijer, J. W. Gerlach, P. Räcke, S. Liedtke, S. Rauschenbach, and B. Rauschen-bach, Presentation held at the workshop “Oberflächentechnologie mit Plasma- und Ionenstrahlprozessen” [Surface technologies using plasma and ion beam processes] in Mühlleiten (2016), http://home.uni-leipzig.de/iom/muehlleithen/2016/Spemann.pdf.
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Near-Surface Electrical Characterization of Silicon Electronic Devices Using Focused keV-Range Ions;Physical Review Applied;2022-09-14
2. Nanoscale multiply charged focused ion beam platform for surface modification, implantation, and analysis;Review of Scientific Instruments;2022-04-01
3. Nanoscale ion implantation using focussed highly charged ions;New Journal of Physics;2020-08-01
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