Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap-Reference-Cited by-同舟云学术

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Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap

Published:2007 Issue:6 Volume:25 Page:2162
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ullmann Falk,Grossmann Frank,Ovsyannikov Vladimir P.,Gierak Jacques,Bourhis Eric,Ferré Jacques,Jamet Jean Pierre,Mougin Alexandra,Zschornack Günter

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoscale ion implantation using focussed highly charged ions;New Journal of Physics;2020-08-01

2. EBIS-based HCI micro-beams;AIP Conference Proceedings;2018

3. Liquid metal alloy ion sources—An alternative for focussed ion beam technology;Applied Physics Reviews;2016-06

4. Direct-Write Ion Beam Lithography;Journal of Nanotechnology;2014

5. Using electron spectroscopy to verify the model of Ga implanted during focused ion beam circuit editing;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11

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