Insulator surface charging and dissipation during plasma immersion ion implantation using a thin conductive surface film
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1503149
Reference12 articles.
1. PBII processing of dielectric layers: physical aspects limitations and experimental results
2. Plasma immersion ion implantation using polymeric substrates with a sacrificial conductive surface layer
3. High voltage sheath behavior in a drifting plasma
4. Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: measurements and analytical considerations
5. Model for expanding sheaths and surface charging at dielectric surfaces during plasma source ion implantation
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