Plasma immersion ion implantation using polymeric substrates with a sacrificial conductive surface layer
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. State-of-the-art overview: ion beam surface modification of polymers towards improving tribological properties
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3. Model for expanding sheaths and surface charging at dielectric surfaces during plasma source ion implantation
4. Plasma immersion ion implantation with dielectric substrates
5. J.N. Matossian, R.W. Schumacher, D.M. Pepper, US Patent 5374456, Hughes Aircraft Company, Los Angeles, CA, 1994.
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