Polarization-induced 2D hole gases in pseudomorphic undoped GaN/AlN heterostructures on single-crystal AlN substrates

Author:

Zhang Zexuan1ORCID,Encomendero Jimy1ORCID,Chaudhuri Reet1ORCID,Cho Yongjin1ORCID,Protasenko Vladimir1,Nomoto Kazuki1,Lee Kevin1ORCID,Toita Masato2,Xing Huili Grace134ORCID,Jena Debdeep134ORCID

Affiliation:

1. School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA

2. Advanced Devices Technology Center, Asahi Kasei Corporation, Hibiya Mitsui Tower, 1-1-2 Yurakucho, Chiyoda-ku, Tokyo 100-8440, Japan

3. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA

4. Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853, USA

Funder

Asahi Kasei Corporation

National Science Foundation

U.S. Department of Energy

Air Force Office of Scientific Research

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference34 articles.

1. K. Nomoto , R. Chaudhuri , S. Bader , L. Li , A. Hickman , S. Huang , H. Lee , T. Maeda , H. Then , M. Radosavljevic et al., in IEEE International Electron Devices Meeting (IEDM) ( IEEE, 2020), pp. 8–3.

2. Gate-Recessed E-mode p-Channel HFET With High On-Current Based on GaN/AlN 2D Hole Gas

3. A polarization-induced 2D hole gas in undoped gallium nitride quantum wells

4. An Experimental Demonstration of GaN CMOS Technology

5. Regrowth-Free GaN-Based Complementary Logic on a Si Substrate

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