Insitustudy of film stresses in metal silicides using absorption‐edge‐contour mapping
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346384
Reference8 articles.
1. Nucleation‐controlled thin‐film interactions: Some silicides
2. The measurement of strain fields by X-ray topographic contour mapping
3. Measurement of thermal stress in Pd2Si film on Si(111) by absorption edge contour mapping
4. Observations of stresses in thin films of palladium and platinum silicides on silicon
5. An X-ray study of domain structure and stress in Pd2Si films at Pd-Si interfaces
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Mechanisms of Stress Generation in Thin Films and Coatings;Technical Physics;2020-12
2. In-situ study of stress evolution during solid state reaction of Pd with Si(001) using synchrotron radiation;Microelectronic Engineering;2003-11
3. Influence of Si substrate orientation on stress development in Pd silicide films grown by solid-state reaction;Applied Physics Letters;2003-08-18
4. Stresses arising from a solid state reaction between palladium films and Si(001) investigated byin situcombined x-ray diffraction and curvature measurements;Journal of Applied Physics;2003-08
5. Silicide formation at palladium surfaces. Part I: Crystalline and amorphous silicide growth at the Pd(110) surface;Surface Science;1998-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3