Observations of stresses in thin films of palladium and platinum silicides on silicon-Reference-Cited by-同舟云学术

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Observations of stresses in thin films of palladium and platinum silicides on silicon

Published:1980-01 Issue:1 Volume:17 Page:471-475
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Angilello J.,d’Heurle F.,Petersson S.,Segmüller A.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.570486

Cited by 43 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hot target magnetron sputtering for ferromagnetic films deposition;Surface and Coatings Technology;2018-01

2. In situ combined synchrotron X-ray diffraction and wafer curvature measurements during formation of thin palladium silicide film on Si(001) and Si (111);Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-08

3. Stress Development and Relaxation during Reaction of a Cobalt Film with a Silicon Substrate;Defect and Diffusion Forum;2005-04

4. Kinetic analysis and correlation with residual stress of the Ni/Si system in thin film;MRS Proceedings;2005

5. Exploring Ni–Si thin-film reactions by means of simultaneous synchrotron X-Ray diffraction and substrate curvature measurements;Materials Science and Engineering: B;2004-12

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